FM03 Type:Vortex Flow meter

FM03 Type:Vortex Flow meter

Karman Vortex Flow Meter employs the follow-ing principle for measurement of flows: When a columnar object (object that generates vortices) is placed in the flow path of a fluid, regular channels of vortices, called Karman vortex channels, are generated at the back of the object. Since the frequency of a vortex generated is linearly propor-tional to the flow velocity within a given range, the flow amount can be measured by counting the number of vortices. When the frequency of each vortex generated is detected by the incorporated vortex detector (piezoelectric device), the signal processing circuit outputs a signal which is linearly pro-portional to volume flow.
  • Features

    ・Because of no moving part, the meter has superior reliability and dura-bility and no error in mounting position is produced.
    ・Simple construction (its flow path of fluid contains a columnar object and a vortex detector only) ensures low pressure loss and low liquid leak. In addition, the detector does not get into contact with the fluid running through the path, therefore, it is ideal for process monitoring of various liquids.
    ・Two types of particle-free body materials (PPS and PFA) are available for choice according to your needs.
    ・Global specifications (Certification for CE Marking already acquired)
    ・Since Teflon is the material for the entire wetted part and no O-ring is in use, the Model31 Series Karman Vortex Flow Meter is optimum for mon-itoring liquid flows in the manufacturing process of semiconductors.

    Standard Specifications

    Model

    FM0301

    FM0302

    FM0303

    FM0304

    Flow Range

    0.4~4 L/min

    2~20 L/min

    5~50 L/min

    10~100 L/min

    Connection(X)

    3/8" Pipe end

    1/2" Pipe end

    3/4" Pipe end

    1" Pipe end

    Fluids for measurement

    Ultrapure water,Chemicals,and other liquids

    Measuring accuracy

    within ±3.0 % FS + 1 digit

    Repeatability

    within ±0.5 % FS

    Liquid temperature range

    0~90℃ ( No bedewing,no boiling)

    Amb. Temperature range

    0~50

    Output

    With indicator

    LED display in 3 digits

    Current output:4~20mA (linear)

    Alarm output:Open collector(2 LEDs;80mA,30 VDC max.)

    Without indicator

    Current output:4~20mA (linear)

    Pulse output:4~20mA (linear)

    Suppply voltage

    12~24 Vdc

    Material for body part

    All Teflon® (PFA),without O-rings

    Material for Cover part

    Polybutylene terephthalate(PBT) resin

    Material for Cable part

    2 meter long;conductor:Tinned bare annealed copper wire;                                                                      Sheath:Heat-/Cold-resistant polyvinyl chloride(POC)


    Applications

    ・FA instruments
    ・Semiconductor manufacturing
    ・LCD
    ・Housing material production
    ・Medicine production
    ・Chemical industry
    ・Biomedical applications
    ・Environment systems
    ・Food processing
    ・Agricultural/Botanical applications

    What is Vortex flow meter

    Composition of vortex flowmeter[edit]

    A vortex flowmeter comprising: a flow sensor operable to sense pressure variations due to vortex-shedding of a fluid in a passage and to convert the pressure variations to a flow sensor signal,in the form of an electrical signal;and a signal processor operable to receive the flow sensor signal and to generate an output signal corresponding to the pressure variations due to vortex-shedding of the fluid in the passage.[2]

    Working principle[edit]

    When the medium flows through the Bluff body at a certain speed,an alternately arranged vortex belt is generated behind the sides of the Bluff body, called the "von Kármán vortex". Since both sides of the vortex generator alternately generate the vortex,the pressure pulsation is generated on both sides of the generator,which makes the detector produce alternating stress. The piezoelectric element encapsulated in the detection probe body generates an alternating charge signal with the same frequency as the vortex, under the action of alternating stress. The frequency of these pulses is directly proportional to flow rate. The signal is sent to the intelligent flow totalizer to be processed after being amplified by the pre-amplifier.

    In certain range of Reynolds number(2×10^4~7×10^6),the relationship among vortex releasing frequency, fluid velocity, and vortex generator facing flow surface width can be expressed by the following equation:[3]

                  f=St×V/d   
    

    Wherein, f is the releasing frequency of Carmen vortex,St is the Strouhal numberV is velocity, and d is the width of the triangular cylinder.[4]

    Vortex Flow meter application

    1.Smart piping monitor

    The primary reason thermal mass flow meters are popular in industrial applications is the way they are designed and built. They feature no moving parts, nearly unobstructed straight through flow path, require no temperature or pressure corrections and retain accuracy over a wide range of flow rates. Straight pipe runs can be reduced by using dual-plate flow conditioning elements and installation is very simple with minimal pipe intrusions.

    However, in many applications, the thermal properties of the fluid can be dependent upon fluid composition. In such applications, varying composition of the fluid during actual operation can affect the thermal flow measurement. Therefore, it is important for the thermal flow meter supplier to know the composition of the fluid so that the proper calibration factor can be used to determine the flow rate accurately. Suppliers can provide appropriate calibration information for other gas mixtures, however the accuracy of the thermal flow meter is dependent on the actual gas mixture being the same as the gas mixture used for calibration purposes. In other words, the accuracy of a thermal flow meter calibrated for a given gas mixture will be degraded if the actual flowing gas has a different composition.[2]

    2.CVD machine

    What is CVD

    hemical vapor deposition (CVD) is a vacuum deposition method used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.

    In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

    Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystallinepolycrystallineamorphous, and epitaxial. These materials include: silicon (dioxidecarbidenitrideoxynitride), carbon (fibernanofibersnanotubesdiamond and graphene), fluorocarbonsfilamentstungstentitanium nitride and various high-k dielectrics.

     

    3.Valve manifold box/panel (VMB/VMP)

    What is VMB/VMP

    Through our experiences of handling gases, we have acquired the knowledge to design and manufacture gas panel (gas box) of EPI system and MOCVD, material supply system etc.
    Achievements in our business, we are able to design and manufacture to meet customer’s request (price and specification). We can handle the hub ring air supply of liquefied gases not just only normal gases. We also support with var-ous kind of legal application.