Application field

A mass flowmeter, also known as an inertial flowmeter, is a device that measures the mass flow of a fluid through a pipe. Mass flow rate is the mass of fluid passing a fixed point per unit of time.
A mass flow meter does not measure the volume per unit of time (eg, cubic meters per second) passing through the device; it measures the mass per unit of time (eg, kilograms per second) flowing through the device. Volume flow is mass flow divided by fluid density. If the density is constant, the relationship is simple. The relationship is not simple if the fluid has a varying density. The density of fluids may vary with temperature, pressure or composition. The fluid can also be a combination of phases, such as a fluid with entrained air bubbles. Since the speed of sound depends on the controlled liquid concentration, the actual density can be determined. [1]

MFM application
1. Smart Pipe Monitor
The main reason thermal mass flow meters are popular in industrial applications is the way they are designed and manufactured. They have no moving parts, have virtually no obstruction to a straight flow path, require no temperature or pressure correction, and maintain accuracy over a wide flow range. Straight pipe runs can be reduced by using a double plate flow conditioning element, and the installation is very simple and does not cause pipe intrusion.

However, in many applications the thermal properties of the fluid may depend on the fluid composition. In such applications, changes in fluid composition during actual operation can affect heat flow measurements. Therefore, it is important for thermal flow meter suppliers to understand the composition of the fluid so that the appropriate calibration factors can be used to accurately determine flow. Vendors can provide appropriate calibration information for other gas mixtures, but the accuracy of thermal flow meters depends on the actual gas mixture being the same as the one used for calibration purposes. In other words, the accuracy of a thermal flow meter calibrated for a given gas mixture will be reduced if the gas actually flowing has a different composition. [2]

2. CVD machine
What is CVD

Vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance solid materials. This process is commonly used in the semiconductor industry to produce thin films.

In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors that react and/or decompose on the surface of the substrate to produce the desired deposits. Volatile by-products are also typically produced, which are removed by the gas flow through the reaction chamber.

Microfabrication processes widely use CVD to deposit various forms of materials including: single crystal, polycrystalline, amorphous and epitaxy. These materials include: silicon (carbon dioxide, carbides, nitrides, oxynitrides), carbon (fibers, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high k dielectric.

3. Valve Box/Panel (VMB/VMP)
What is VMB/VMP

Through our experience in handling gases, we have gained the knowledge to design and manufacture panels (gas boxes) for EPI systems, MOCVD, material supply systems and more.
Among our business achievements, we are able to design and manufacture products that meet customer requirements (price and specifications). We can handle not only normal gas but also liquefied gas supply for hub rings. We also support various legal applications.